In the production and treatment of silicon wafers, the cleanliness of wafers plays a very important role. Used wafer carriers for transporting wafers have to fulfil high cleanliness requirements.
In order to meet those high requirements, the cleaning agent solution has to contain a sufficient amount of cleaning agent concentration. After the final rinsing process, no cleaning agent residues are allowed to remain on the wafer’s surfaces.
Measuring the surface tension ensures an optimal determination and monitoring of the surfactant concentration in a particular cleaning process. SITA Tensiometers allow a precise control of the surfactant concentration within an optimal range. This leads to a less surfactant consumption and thus to a reduction of the carry-over effect of surfactants in other rinsing baths.
The diagram shows the dynamic surface tension for different cleaning agent concentrations.
The diagram shows the dynamic surface tension for different cleaning agent concentrations.
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