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Monitoring the surfactant concentration in wafer cleaning processes

In the production and treatment of silicon wafers, the cleanliness of wafers plays a very important role. Used wafer carriers for transporting wafers have to fulfil high cleanliness requirements.

In order to meet those high requirements, the cleaning agent solution has to contain a sufficient amount of cleaning agent concentration. After the final rinsing process, no cleaning agent residues are allowed to remain on the wafer’s surfaces.

Measuring the surface tension ensures an optimal determination and monitoring of the surfactant concentration in a particular cleaning process. SITA Tensiometers allow a precise control of the surfactant concentration within an optimal range. This leads to a less surfactant consumption and thus to a reduction of the carry-over effect of surfactants in other rinsing baths.

The diagram shows the dynamic surface tension for different cleaning agent concentrations.


The diagram shows the dynamic surface tension for different cleaning agent concentrations.

SITA clean line ST

Inline-Measurement of Surfactant Concentration

A continual and automatic measurement of surface tension is possible by using the process measuring tensiomter SITA clean line ST. Implementing the measurement technology in the plant control system or using the central control unit SITA clean line CC makes it easy to carry out an automatic dosage of the surfactant component according to the consumption.

Further information about inline-measurement in the process […]

You would like to increase the reliability in cleaning processes? Benefit from our many years of experience and optimize your process together with our experts. We show you the advantages for your production by carrying out a first analysis for you free of charge. Please contact us!

 

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