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Controlling the IPA-concentration in texturing baths

Texturing the end wafer minimizes the light reflection of solar cells and increases their efficiency wherefore potassium hydroxide (KOH) and isopropyl alcohol (IPA) are basically used. IPA reduces the surface tension of the texturing solution and serves as wetting agent. The quality of the textured surface and accordingly the reflective properties of the wafer highly depend on the KOH- and IPA-concentration. Therefore, an application-specific dosing of IPA is required for ensuring high process reliability.


The picture shows the general relationship between the concentration of isopropyl alcohol and the surface tension of the texturing solution. High process reliability is ensured through an automatic IPA dosing according to the consumption.

We offer technical solutions for monitoring and controlling the IPA-concentration in your process. The possibilities range from offline monitoring until continuous inline measurement of surface tension with automatic dosing.


Atline-Monitoring of the Surfactant Concentration

The robust and lightweight hand-held tensiometer, DynoTester+, is well-suited for a flexible atline monitoring. The DynoTester+ quickly takes measurements on-site at the plant and recognizes concentration deviations. In this way, the concentration of washing-active surfactants and the amount of the surfactant component which needs to be added, can be quickly and easy determined.

Further information about atline-measurements at the process [...]

SITA clean line ST

Inline-Measurement of Surfactant Concentration

The process tensiometer, the SITA clean line ST, allows a continual and automatic surface tension measurement for an automatic dosing of surfactant components. This can be realized flexibly either through an integration of the measurement system into the plan control system or by using the SITA clean line CC’s central control unit.

Further information about inline-measurement in the process [...]


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