Texturing the end wafer minimizes the light reflection of solar cells and increases their efficiency wherefore potassium hydroxide (KOH) and isopropyl alcohol (IPA) are basically used. IPA reduces the surface tension of the texturing solution and serves as wetting agent. The quality of the textured surface and accordingly the reflective properties of the wafer highly depend on the KOH- and IPA-concentration. Therefore, an application-specific dosing of IPA is required for ensuring high process reliability.
The picture shows the general relationship between the concentration of isopropyl alcohol and the surface tension of the texturing solution. High process reliability is ensured through an automatic IPA dosing according to the consumption.
We offer technical solutions for monitoring and controlling the IPA-concentration in your process. The possibilities range from offline monitoring until continuous inline measurement of surface tension with automatic dosing.